Analysis of Surface Property of TiO2 Thin Film Prepared by Sputtering

Ching-Hua Wei; Chin-Tu  Lu; Wu-Chung  Sue; Ching-Min Chang; Chun-Ko  Chen

doi:10.6180/jase.2007.10.2.16

Analysis of Surface Property of TiO2 Thin Film Prepared by Sputtering

Ching-Hua Wei¹, Chin-Tu Lu¹, Wu-Chung Sue¹, Ching-Min Chang This email address is being protected from spambots. You need JavaScript enabled to view it.¹ and Chun-Ko Chen¹

¹Department of Mechanical Engineering, Southern Taiwan University of Technology, Tainan, Taiwan 710, R.O.C.

Received: March 16, 2007
Accepted: May 4, 2007
Publication Date: June 1, 2007

Download Citation: ||https://doi.org/10.6180/jase.2007.10.2.16

ABSTRACT

This paper reports the characteristic of titanium dioxide (TiO₂) thin film prepared by sputtering on the ITO glass. The principal parameter in sputtering process is to change temperature of substrate holder in the sputtering chamber. Five different temperatures (22, 50, 100, 150 and 200 ºC) were set on the substrate holder. After preparing TiO₂ thin film, the transparency and absorptive performance of TiO₂ thin film between 200~450 nm were inspected by using UV-VIS spectrophotometer. The hydrophilic property of TiO₂ thin film by UV-light irradiation was observed by using contact angle measurement. The results showed that all the thin films, manufactured at different temperature, had ability to absorb UV-light and to perform good transparency. The contact angle measurement showed the films made by the higher temperature of substrate holder can get better hydrophilic property.

Keywords: Substrate Temperature, Sputtering, TiO2, Hydrophilic Property, Contact Angle, UV-VIS Spectrophotometer

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