@article {10.6180--2139700861,
title = {INFLUENCE OF ARGON AND BARIUM ION IMPLANTATION ON THE DENSITY OF STATES OF SILICON VALENCE ELECTRONS: EXPERIMENT AND THEORY},
author = {Umirzakov, B.E. and Tashmukhamedova, D.A. and Yusupjanova, M.B. and Isakov, B.O.},
volume = 33,
year = 2026,
month = {July},
pub_date = {2026-07-25},
article number = {33(2026)26033050},
doi = {10.6180/jase.202610_33.050},
url = {http://dx.doi.org/10.6180/jase.202610_33.050},
journal = {Journal of Applied Science and Engineering},
issn = {1560-6686},
publisher = {Tamkang University Press}
}